Labotemp High-Temperature Tube Furnace FMT-09 is a precision laboratory tube furnace designed for advanced thermal processing up to 1400°C (working ≤1300°C). It features a ∮40 mm corundum tube, 350 mm heating zone, and 1200 mm tube length. SiC heating rods with PID automatic control and 30-segment programming deliver ±1°C accuracy and ±5°C uniformity. An S-type thermocouple and alumina ceramic-fiber chamber ensure stable, energy-efficient operation in a compact 724×590×807 mm footprint.
Manufactured by a professional furnace manufacturer and supplied through authorised furnace suppliers, the FMT-09 tubular furnace is ideal for material synthesis, sintering, annealing, crystal growth, ceramic processing, powder metallurgy and semiconductor diffusion. The horizontal tubular design supports controlled-atmosphere and vacuum tube furnace configurations with optional touchscreen and PC software.
Why choose Labotemp Tube Furnace FMT-09?
✓ Ultra-High Temperature: Reliable operation up to 1400°C
✓ Precision Control: PID regulation with repeatable thermal profiles
✓ Industrial Build: Corundum tube and SiC heating system
| No. | Specification | Value |
|---|---|---|
| 1 | Maximum Temperature | 1400°C |
| 2 | Standard Heating Zone Length (mm) | 350 |
| 3 | Chamber Size (mm) | 40*350 |
| 4 | Standard Tube Diameter (mm) | ∮40 |
| 5 | Total Length of Furnace Tube (mm) | 1200 |
| 6 | External Size | 724×590×807 mm |
| 7 | Working Temperature (℃) | ≤1300 |
| 8 | Heating Rate | 0 ~ 20℃/min |
| 9 | Temperature Accuracy | ±1 |
| 10 | Temperature Uniformity | ±5 |
| 11 | Furnace Tube Material | Corundum Tube |
| 12 | Heating Element | Sic Heating Rod |
| 13 | Thermocouple Type | S Type |
| 14 | Chamber Material | Alumina Ceramic Fiber |
| 15 | Power Supply | AC 220V, 50Hz/60Hz |
| 16 | Net Weight | 95kg |
| 17 | Gross Weight | 125kg |
| 18 | Accessories Weight | 14Kg |
| 19 | Accessories Package Size | 1100x230x300 mm |
| 20 | Product Package Size | 860x760x1150 mm |
Used for high-temperature material synthesis, sintering, annealing, crystal growth, powder metallurgy, ceramic processing, semiconductor diffusion, coating development, and heat treatment experiments in laboratories
