Labotemp Horizontal Tube Furnace FMT-07 is a manufacturer-grade horizontal tube furnace engineered for high-volume sintering, crystal growth and high-temperature R&D. Rated to 1400°C (working ≤1300°C) with a 205 mm single-zone heating length and ∮40 mm corundum tube, it combines S-type thermocouple accuracy (±1°C) with SiC heating rods and an alumina-fiber chamber to deliver robust, repeatable results for laboratories, universities and industrial furnace suppliers.
Ideal as a lab furnace, laboratory tube furnace or tubular furnace for sintering, annealing, powder metallurgy, semiconductor diffusion and ceramic processing. Supplier-ready and production-proven, it supports vacuum tube furnace, high-temperature tube furnace and tubular furnace applications. PID 30-segment programming, optional touchscreen/PC control and dependable manufacturer support make it a reliable choice for professional furnace operations.
Why choose Labotemp Tube Furnace FMT-07?
✓ Precision Control: PID regulation with 30-segment programmable profiles.
✓ High-Temperature Capacity: 1400°C maximum for advanced ceramic and crystal processing.
✓ Precision control: PID regulation, B-type thermocouple and 30-seg profiling.
| No. | Specification | Value |
|---|---|---|
| 1 | Maximum Temperature | 1400°C |
| 2 | Standard Heating Zone Length (mm) | 205 |
| 3 | Chamber Size (mm) | 40*205 |
| 4 | Standard Tube Diameter (mm) | ∮40 |
| 5 | Total Length of Furnace Tube (mm) | 800 |
| 6 | External Size | 630×590×767 mm |
| 7 | Working Temperature (℃) | ≤1300 |
| 8 | Temperature Accuracy | ±1 |
| 9 | Furnace Tube Material | Corundum Tube |
| 10 | Thermocouple Type | S Type |
| 11 | Temperature Uniformity | ±5 |
| 12 | Heating Element | SiC Heating Rod |
| 13 | Chamber Material | Alumina Ceramic Fiber |
| 14 | Power Supply | AC 220V, 50Hz/60Hz |
| 15 | Net Weight | 80kg |
| 16 | Gross Weight | 108kg |
| 17 | Accessories Weight | 10Kg |
| 18 | Accessories Package Size | 1450*150*165 |
| 19 | Product Package Size | 760*770*1130 |
Used for high-temperature material synthesis, sintering, annealing, crystal growth, powder metallurgy, ceramic processing, semiconductor diffusion, coating development, and heat treatment experiments in laboratories, universities, and industrial R&D centers
